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Such aluminum nitride susceptors can include an embedded heater element and/or embedded ground or RF electrodes which as a result of their embedment are protected from the deleterious effects of the processing chamber environment. Vacuum and purge gas can then be distributed through passages in the wafer support plate as appropriate to its

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Sigma Aldrich process of silicon dioxide wafers (oxide thickness : 280 300 nm). The wafer will be employed as the backgate for transistor application, such as like MOSFET. Though, its size isn that important but preferred (100) orientation. Researchers have used the following wafer spec: 100mm P (100) 1-10 ohm-cm SSP 500um Prime Grade with

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These are the circle, ellipse, parabola and hyperbola, depending on the angle of the plane to the angle of the cone. of an off-axis wafer will be equal to the crystals lattice constant divided by the cosine of the angle at which the wafer is cut; this can be used to match the lattice constant of a different material allowing that material

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Steels deoxidized or treated with calcium or calcium and silicon can have better ma bility than those deoxidized with aluminum and silicon. It is marketed as low iron, containing 22%28% calcium, 65%70% silicon, and 5% maximum iron, and as high iron, containing 18%22% calcium, 58%60% silicon, and 15%20% iron.

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CNA - A kind of transverse direction gallium

The present invention provides a kind of lateral gallium nitride rectifying device, includingubstrate base, gallium nitride layer, barrier layer, first medium layer, and the second dielectric layer above first medium layer, wherein the first end of first medium layer has perforation first medium layer and ends in the first opening of barrier layer, and cathodic metal is formed in

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For the material of the dielectric body, alumina, aluminum nitride, polyimide or the like may be used. Generally, ceramics such as alumina is a complete isolator having a specific volume resistance of about cm, and therefore causes no charge transfer within the material, and a coulonbic force acts as absorption force.

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Resistance heated stem mounted aluminum susceptor assembly

a susceptor wafer support plate composed of aluminum nitride having a heater element and an electrode embedded therein wherein said heater element is positioned on a first plane generally parallel to a wafer support surface of the support plate and said electrode is positioned in a second plane generally parallel to the wafer support surface of

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